Tin Oxide Nanowires

Tin Oxide Nanowires

Elements specialize in producing high purity uniform shaped Tin Oxide Nanowire with the highest possible density for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low-Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Metal Wire sizes range from 0.75 mm to 1 mm to 2 mm diameter with strict tolerances and alpha values (conductive resistance) for uses such as gas detection and thermometry tolerances. Please contact us to fabricate custom wire alloys and gauge sizes. Materials are produced using crystallization, solid-state, and other ultra high purification processes such as sublimation. Elements specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Elements also cast any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Tin as powder, ingot, pieces, pellets, disc, granules, and in compound forms, such as oxide. Other shapes are available by request.