Our Products

LAO Single Crystal Substrate
LAO Single Crystal Substrate (Purity: >99.9%, Size:10*10*0.5mm)
November 6, 2017
Gallium Nitride wafer
Gallium Nitride wafer (Purity: >99.9%, Diameter: 2″, Undoped)
November 6, 2017
Show all

Bismuth Sputtering Target (Bi, Purity: 99.99%)


Bismuth Sputtering Target

Bismuth Sputtering Target (Bi, Purity: 99.99%)

 Bismuth Sputtering Target (Bi, Purity: 99.99%)
Product No. CAS Purity Thickness Diameter Shape Appearance Melting Point
NRE-43010 7440-69-9 >99.9% 3 mm ± 0.5mm 50 mm ± 1mm Round solid 1564 °C
Molecular Weight 208.98 g/mol
Molecular Formula Bi
Density 9.78 g/cm³

Boron Nitride Sputtering Target Composition:

Bi

99.99%

Carbide

20%

Bismuth Sputtering Target

Provide us an opportunity to fulfill all your requirements related to nano-materials Call us at +91-7864020002,+1-518-889-9730 Or Email Us at [email protected]

Contact for SDS