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Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)
November 6, 2017
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November 6, 2017
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Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)


Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)

Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)
Product No. CAS Purity Thickness Diameter Shape Form Melting Point
NRE-43025 7440-43-9 >99.99% 3 mm ± 0.5mm 50 mm ± 1mm Round Na Na
Molecular Weight NA
Product Type NA
Density NA
Constantan Resistance Alloy Sputtering Target Composition

Cu

55%

Ni

45%

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