Gadolinium Cerium Oxide Sputtering Targets

Gadolinium Cerium Oxide Sputtering Targets

Gadoinium cerium oxide (GdCeOₓ) sputtering targets are used in various advanced material and device applications due to their unique properties. Here’s a detailed look at their applications and relevant considerations.

Applications

Solid Oxide Fuel Cells (SOFCs):

Electrolytes: Gadolinium-doped cerium oxide (GDC) is a common electrolyte material in SOFCs. It offers high ionic conductivity at intermediate temperatures, which is crucial for efficient fuel cell operation.

Catalysis:

Catalytic Supports: GdCeOₓ can be used as a support material in catalytic processes. It provides a stable surface and can enhance the performance of catalysts used in various chemical reactions.

Thin Film Coatings:

Protective Coatings: Thin films of GdCeOₓ can be used as protective coatings in harsh environments due to their chemical stability and resistance to corrosion.

Optical Coatings: These thin films can also be used in optical coatings, where their properties can be tailored for specific wavelengths or optical functions.

Magnetic Materials:

Magnetic Thin Films: Gadolinium and cerium can impart magnetic properties to thin films, which can be useful in magnetic storage devices and other magnetic applications.

Electrochemical Sensors:

Sensors: GdCeOₓ films can be used in electrochemical sensors for detecting various gases or ions, leveraging their ionic conductivity and stability.

Electronics:

Dielectric Materials: The material can be used in electronic devices where high dielectric constant properties are required, particularly in thin film capacitors and other components.

Sputtering Process

Sputtering Technique: In the sputtering process, high-energy ions are used to eject atoms from the GdCeOₓ target.

Target Composition: The composition of the target (ratio of Gd to Ce and the amount of oxygen) can be adjusted to achieve specific properties in the deposited films.