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Gallium Oxide Doped Zinc Oxide Sputtering Targets

Gallium Oxide Doped Zinc Oxide Sputtering Targets

Gallium Oxide Doped Zinc Oxide Sputtering Targets
Product No NRE-43421
CAS No.  52934-06-2
Formula GZO
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Gallium Oxide Doped Zinc Oxide Sputtering Targets

Gallium oxide doped zinc oxide (GZO) sputtering targets are increasingly used in various applications due to their unique properties. Here are some key applications.

Transparent Conductive Films

Display Technologies: GZO is widely used as a transparent conductive oxide (TCO) in flat-panel displays, OLEDs, and touch screens, providing high electrical conductivity while allowing light to pass through.

Solar Cells: In photovoltaic devices, GZO can serve as a TCO layer, improving light absorption and electrical performance.

Sensor Applications

Gas Sensors: GZO can be used in gas sensing devices, benefiting from its sensitivity to various gases and its stability at high temperatures.

UV Sensors: The material can be applied in UV photodetectors due to its wide bandgap and transparency in the UV range.

Optoelectronic Devices

LEDs: GZO can be used as a contact layer in LEDs, enhancing their performance by providing good electrical conductivity and transparency.

Thin Film Transistors (TFTs)

GZO is used in the fabrication of TFTs for applications in displays and electronic circuits, where high mobility and low leakage current are essential.

 Antistatic Coatings

GZO films can provide antistatic properties for various surfaces, helping to prevent dust accumulation and improving durability.

 Heating Elements

GZO can be utilized in resistive heating applications due to its thermal stability and conductive properties.

 

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