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Gallium Oxide Sputtering Target

Gallium Oxide Sputtering Target

Gallium Oxide Sputtering Target
Product No NRE-43056
CAS No. 12024-21-4
Formula Ga2O3
Molecular Weight 187.44 g/mol
Purity 99.9%
Density 6.44 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Electrical Resistivity NA
Electronegativity NA

Gallium Oxide Sputtering Target

Gallium oxide (Ga2O3) sputtering targets are used in various applications due to their unique properties, including wide bandgap, high thermal stability, and potential for n-type conductivity. Here are some key applications.

 Power Electronics

High-Voltage Devices: Ga2O3 is being explored for high-voltage applications due to its high breakdown voltage, making it suitable for power transistors and diodes.

Transparent Conductive Oxides

Optoelectronics: Ga2O3 can be used as a transparent conductive oxide (TCO) in displays, LEDs, and solar cells, where high conductivity and transparency are required.

UV Photodetectors

Sensing Applications: Ga2O3’s sensitivity to UV light makes it ideal for photodetectors in environmental monitoring, safety, and industrial applications.

Thin Film Transistors (TFTs)

Displays: Ga2O3 is utilized in the fabrication of TFTs for LCDs and OLEDs, providing improved performance and stability.

Gas Sensors

Environmental Monitoring: Ga2O3 films can be employed in gas sensing applications, detecting various gases due to their sensitivity and stability.

 High-Temperature Applications

Ceramics and Coatings: Ga2O3 can be used in high-temperature ceramics and protective coatings due to its thermal stability and resistance to oxidation.

Electronics

Substrates: Ga2O3 is being researched as a substrate material for growing other semiconductor materials, particularly in the development of advanced electronic devices.

Photovoltaics

Solar Cells: As a TCO, Ga2O3 can enhance the performance of solar cells, improving light absorption and overall efficiency.

 

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