Our Products

Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)
November 7, 2017
Cobalt Sputtering Target (Baked With Indium Bonded, Purity: 99.99%)
November 7, 2017
Show all

Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)


Hafnium Aluminium Oxide Sputtering Target

Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)

Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)
Product No. CAS Purity Thickness Diameter Shape Electrical Resistivity Appearance
NRE-43037 12055-23-1 >99.99% 3 mm ± 0.5mm 50 mm ± 1mm Round 9 10x Ω-m White
Molecular Weight 210.49 g/mol
Molecular Formula HfAlO2
Density 9.7 g/cm3

Hafnium Aluminium Oxide Sputtering Target

Provide us an opportunity to fulfill all your requirements related to nano-materials Call us at +91-7864020002,+1-518-889-9730 Or Email Us at [email protected]

Contact for SDS