Hafnium Fluoride Sputtering Targets
Hafnium Fluoride Sputtering Targets
| Hafnium Fluoride Sputtering Targets | |
| Product No | NRE-43439 |
| CAS No. | 13709-52-9 |
| Formula | HfF4 |
| Molecular Weight | 254.48 |
| Purity | >99.9% |
| Density | 7.1 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Hafnium Fluoride Sputtering Targets
Introduction
Hafnium fluoride (HfF₄) sputtering targets are specialized materials used in the sputtering process for depositing thin films in various applications. Sputtering is a widely employed technique in material science, particularly for creating thin layers of materials on substrates for electronics, optics, and coatings.
Applications
Semiconductor Manufacturing:
HfF₄ is utilized in the production of high-k dielectric films, which are essential for modern transistors and capacitors. These films improve the performance of devices by allowing for reduced size and increased capacitance.
Optical Coatings:
In optics, hafnium fluoride is used to create anti-reflective coatings and mirrors. Its optical properties enhance the efficiency and performance of lenses and optical devices.
Protective Coatings:
HfF₄ provides excellent thermal stability and chemical resistance, making it suitable for protective layers in harsh environments, such as aerospace components or industrial machinery.
Microelectromechanical Systems (MEMS):
The material is used in MEMS fabrication, where thin films contribute to the functionality and reliability of miniature devices.
Research and Development:
Hafnium fluoride targets are also valuable in research settings, enabling the exploration of new materials and thin film technologies for various applications.
Overall, hafnium fluoride sputtering targets play a vital role in enhancing the performance and functionality of advanced technologies across multiple sectors.
