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Indium Arsenide Sputtering Targets

Indium Arsenide Sputtering Targets

Indium Arsenide Sputtering Targets
Product No NRE-43446
CAS No. 1303-11-3
Formula InAs
Molecular Weight 189.74
Purity >99.9%
Density 5.67 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Indium Arsenide Sputtering Targets

Indium arsenide (InAs) sputtering targets are primarily used in the fabrication of semiconductor devices, particularly in the production of high-speed electronics and optoelectronics. Here are some key applications.

Infrared Detectors: InAs is sensitive to infrared light, making it suitable for infrared sensor applications, such as thermal imaging and spectroscopy.

High Electron Mobility Transistors (HEMTs): InAs is used in the development of HEMTs, which are important for high-frequency and high-speed applications, including telecommunications.

Quantum Dots: InAs quantum dots are used in various optoelectronic applications, including lasers and photodetectors, due to their tunable bandgap properties.

Photovoltaic Cells: InAs can be used in multi-junction solar cells to improve efficiency by absorbing a wider range of the solar spectrum.

Nanoelectronics: The unique electronic properties of InAs make it a material of interest in the development of next-generation nanoelectronic devices.

Research and Development: InAs is often used in research settings to study semiconductor physics and to develop new materials and devices.

Sputtering is a preferred deposition technique for these applications due to its ability to create thin films with precise thickness control and uniformity.

 

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