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Indium Iron Oxide Sputtering Targets

Indium Iron Oxide Sputtering Targets

Indium Iron Oxide Sputtering Targets
Product No NRE-43224
CAS No. NA
Formula InFe2O4
Molecular Weight 290.51
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Indium Iron Oxide Sputtering Targets

Introduction

Indium iron oxide (InFe2O4) sputtering targets are specialized materials used in the deposition of thin films for various applications, particularly in electronics and optoelectronics. This compound combines indium oxide and iron oxide, resulting in unique electrical and magnetic properties that make it suitable for advanced technological uses.

Key Features:

Semiconducting Properties: InFe2O4 exhibits semiconducting behavior, making it useful in various electronic applications.

Magnetic Characteristics: It has magnetic properties that can be tailored for specific applications, such as magnetic sensors and devices.

Wide Bandgap: The wide bandgap of InFe2O4 makes it suitable for applications in optoelectronics, particularly in ultraviolet (UV) and visible light ranges.

Applications:

Electronics: Indium iron Oxide Sputtering Targets is used in the fabrication of electronic components, including thin-film transistors (TFTs) and diodes, leveraging its semiconducting properties.

Optoelectronics: Its optical characteristics allow for applications in UV photodetectors and other optoelectronic devices.

Sensors: The magnetic and electrical properties of indium iron oxide make it suitable for various sensors, including gas sensors and magnetic field sensors.

Transparent Conductors: can be used as a transparent conductive oxide (TCO) in applications requiring both conductivity and transparency.

Data Storage: Its magnetic properties make it a candidate for use in data storage technologies, particularly in magnetic memory devices.

 

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