Indium Molybdenum Oxide Sputtering Targets
Indium Molybdenum Oxide Sputtering Targets
Indium Molybdenum Oxide Sputtering Targets | |
Product No | NRE-43225 |
CAS No. | NA |
Formula | In2O3/Mo |
Molecular Weight | NA |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Indium Molybdenum Oxide Sputtering Targets
Introduction
Indium molybdenum oxide (IMO) sputtering targets are advanced materials used in the deposition of thin films for various electronic and optoelectronic applications. This compound combines indium oxide and molybdenum oxide, resulting in unique electrical, optical, and thermal properties that make it suitable for cutting-edge technology.
Applications:
Transparent Conductive Oxides (TCOs): IMO is commonly used as a TCO in applications such as flat-panel displays, touchscreens, and solar cells, where both transparency and conductivity are required.
Thin-Film Transistors (TFTs): Indium molybdenum oxide is utilized in the production of TFTs, which are essential components in modern display technologies, including LCD and OLED screens.
Photovoltaic Cells: The material can enhance the efficiency of thin-film solar cells by serving as a conductive layer, improving light absorption and overall performance.
Sensors: IMO’s unique properties make it suitable for various sensor applications, including gas sensors and photodetectors.
Optoelectronic Devices: Its combination of electrical and optical properties enables its use in devices such as light-emitting diodes (LEDs) and laser systems.