Manganese Oxide Sputtering Targets
Manganese Oxide Sputtering Targets
| Manganese Oxide Sputtering Targets | |
| Product No | NRE-43493 |
| CAS No. | 1317-34-6 |
| Formula | Mn2O3 |
| Molecular Weight | 157.8743 g/mol |
| Purity | >99.9% |
| Density | 4.50 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Manganese Oxide Sputtering Targets
Introduction:
Manganese oxide (MnO) sputtering targets are materials used in thin film deposition processes, particularly in the field of materials science and electronics. They are valued for their unique electrical, optical, and magnetic properties, making them suitable for various high-tech applications.
Applications
Thin Film Transistors: Utilized in the production of transparent conductive films for displays and sensors, enhancing performance in electronic devices.
Battery Technology: Employed as cathode materials in lithium-ion batteries, improving energy density and overall battery efficiency.
Photovoltaics: Used in solar cell manufacturing to enhance light absorption and improve conversion efficiency.
Magnetic Materials: Contributes to the development of magnetic thin films for data storage and spintronic devices, leveraging its magnetic properties.
Catalysis: Applied in catalytic processes, particularly in environmental applications such as gas sensors and catalytic converters.
Conclusion
Manganese oxide sputtering targets are integral to advancing technologies in electronics, energy storage, and environmental applications, making them essential in various cutting-edge industries. Their unique properties allow for innovative solutions in modern material design.
