Molybdenum Sputtering Target (Mo, Purity: 99.99%)

Molybdenum Sputtering Target

Introduction

Molybdenum sputtering target are materials used in physical vapor deposition (PVD) processes to create thin films of molybdenum. Molybdenum (Mo) is a transition metal known for its high melting point, strength, and excellent conductivity. These characteristics make molybdenum an ideal choice for a wide range of applications in electronics, optics, and aerospace.

Applications

Electronics:

Thin Film Transistors (TFTs): Molybdenum is used as a conductive material in TFTs for display technologies, providing stable and reliable layers.

Interconnects: Employed as a material for interconnections in integrated circuits, benefiting from its excellent conductivity and mechanical properties.

Optoelectronics:

Photovoltaic Cells: Molybdenum films are utilized in solar cells, particularly in back contact layers, enhancing energy efficiency and performance.

Optical Coatings: Used in coatings for lenses and mirrors, leveraging its optical properties.

Aerospace and Defense:

High-Temperature Components: Molybdenum is used in components exposed to extreme temperatures, such as turbine blades and heat shields.

Structural Materials: Its high strength and thermal resistance make it suitable for aerospace structural applications.

Wear-Resistant Coatings:

Molybdenum films can serve as protective coatings on various tools and components, enhancing wear resistance and extending their lifespan.

Semiconductors:

Gate and Source Contacts: Molybdenum is used in semiconductor applications for contacts in devices like MOSFETs, where its conductivity is advantageous.

Catalysis

Investigated for use in catalytic applications, particularly in the production of chemicals and in hydrogen production processes.