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Tantalum Sulfide Sputtering Targets

Tantalum Sulfide Sputtering Targets

Tantalum Sulfide Sputtering Targets
Product No NRE-43563
CAS No. 12143-72-5
Formula TaS2
Molecular Weight 245.08
Purity >99.9%
Density 6.86 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Tantalum Sulfide Sputtering Targets

Applications

Tantalum sulfide sputtering targets is a compound known for its interesting electronic and optical properties, making it valuable in various applications. Here are some key applications of tantalum sulfide sputtering targets.

Semiconductor Devices:

Thin Film Transistors (TFTs): Tantalum sulfide is used in the fabrication of thin film transistors, contributing to high-performance electronic devices with improved mobility and efficiency.

Optoelectronic Applications:

Due to its unique optical properties, tantalum sulfide can be employed in photodetectors, light-emitting devices, and other optoelectronic components.

Photovoltaics:

Tantalum sulfide can be utilized in thin-film solar cells, enhancing light absorption and improving energy conversion efficiency.

Two-Dimensional Materials Research:

As a transition metal dichalcogenide, tantalum sulfide is of interest in the study of two-dimensional materials, which are crucial for the development of next-generation nanoelectronics and flexible devices.

Sensing Applications:

Tantalum sulfide’s sensitivity to environmental changes makes it suitable for gas sensors and other sensing technologies.

Catalytic Applications:

Tantalum sulfide may also serve as a catalyst or catalyst support in certain chemical reactions, particularly in processes related to hydrogen evolution and electrochemical applications.

 

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