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Terbium Iron Sputtering Targets

Terbium Iron Sputtering Targets

Terbium Iron Sputtering Targets
Product No NRE-43569
CAS No. NA
Formula Tb-Fe
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Terbium Iron Sputtering Targets

Terbium iron sputtering targets are utilized in various advanced material applications due to their unique magnetic and electronic properties. Here are some key applications.

Magnetic Materials: TbFe is known for its strong magnetic properties, making it suitable for applications in permanent magnets and magnetic storage devices. The combination of terbium and iron enhances the overall magnetic performance.

Spintronics: In spintronic devices, where the spin of electrons is utilized alongside their charge, TbFe can be used to create materials with desirable spin polarization characteristics, potentially improving device efficiency and functionality.

Thin Film Deposition: TbFe targets are used in sputtering processes to create thin films for various applications, including sensors and magnetic films, which can enhance performance in data storage and processing.

Optical Devices: The unique properties of TbFe can be exploited in optical applications, such as coatings that require specific magnetic or optical characteristics.

Laser Technology: Terbium and iron compounds can be incorporated into laser systems, particularly in solid-state lasers, to enhance their performance and efficiency.

Catalysis: TbFe may also have potential applications in catalysis, particularly in reactions that benefit from its magnetic properties, which can facilitate separation and recovery processes.

 

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