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Titanium Fluoride Sputtering Targets

Titanium Fluoride Sputtering Targets

Titanium Fluoride Sputtering Targets
Product No NRE-43584
CAS No. 13470-08-1
Formula TiF3
Molecular Weight 104.86
Purity >99.9%
Density 3.4 g/mL at 25 °C (lit.)
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Titanium Fluoride Sputtering Targets

Introduction:

Titanium fluoride sputtering targets is an inorganic compound known for its unique properties, including high thermal stability, low friction, and chemical resistance. It is primarily used in applications that leverage these characteristics, particularly in coatings and specialized materials. Titanium fluoride sputtering targets are employed to deposit thin films of TiF₄ onto various substrates through sputtering, allowing for precise control over the film’s composition, thickness, and microstructure.

Applications:

Protective Coatings:

TiF₄ coatings are applied to various surfaces to provide protection against corrosion and wear. These coatings are beneficial in harsh environments, extending the lifespan of components.

Low Friction Coatings:

The low friction properties of titanium fluoride make it suitable for applications requiring lubricious surfaces, such as bearings and sliding components in machinery.

Optical Coatings:

Titanium fluoride can be used in optical applications, providing anti-reflective coatings and improving light transmission in lenses and optical devices.

Electrical Insulation:

TiF₄ films serve as electrical insulators, making them useful in electronic components where dielectric properties are essential.

Catalysis:

Titanium fluoride can be utilized in catalytic processes, particularly in reactions where its unique chemical properties enhance efficiency.

Biomedical Applications:

Due to its biocompatibility and resistance to corrosion, titanium fluoride is explored for use in certain biomedical devices and coatings, promoting durability and compatibility with biological tissues.

Surface Treatment:

TiF₄ is used in surface treatment processes to modify the surface characteristics of materials, improving adhesion and wear resistance.

Sputtering Process

The sputtering process for titanium fluoride involves using a TiF₄ target in a vacuum chamber. Energetic ions bombard the target, causing titanium and fluorine atoms to be ejected and deposited onto a substrate, forming a thin film.

 

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