Titanium Niobium Tantalum Zirconium Sputtering Target
Titanium Niobium Tantalum Zirconium Sputtering Target
| Titanium Niobium Tantalum Zirconium Sputtering Target | |
| Product No | NRE-43161 |
| CAS No. | NA |
| Formula | Ti–23 Nb–0.7Ta–2Zr |
| Molecular Weight | NA |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Electrical Resistivity | NA |
| Electronegativity | NA |
Titanium Niobium Tantalum Zirconium Sputtering Target
Titanium niobium tantalum zirconium sputtering target are used in a variety of advanced applications due to their unique properties. Here are some key applications.
Biomedical Implants: These alloys are highly biocompatible, making them ideal for coatings on orthopedic implants and dental devices. They enhance wear resistance and corrosion resistance in bodily environments.
Thin Film Deposition: Ti–23 Nb–0.7Ta–2Zr targets are used in physical vapor deposition (PVD) processes to create thin films for electronics and optics, providing superior adhesion and durability.
Aerospace Components: Their high strength and lightweight characteristics make them suitable for aerospace applications, particularly in parts that require high performance under extreme conditions.
Electronics: These targets are employed in the semiconductor industry for creating conductive and insulating layers, improving the efficiency and reliability of electronic devices.
Research and Material Development: The alloy’s composition allows for exploration of new materials and coatings, making them valuable in academic and industrial research settings.
Overall, Ti–23 Nb–0.7Ta–2Zr sputtering targets are significant in high-tech applications due to their mechanical properties, biocompatibility, and versatility.
