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October 16, 2017
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Titanium(IV) Oxide Nanowire


Elements specializes in producing high purity uniform shaped Titanium Oxide Nanowire with the highest possible density for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Metal….

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Titanium(IV) Oxide Nanowire

Titanium(IV) Oxide Nanowire Properties
Product No. CAS No. Formula Molecular Weight Purity Average diameter Average Length Form
NRE-13013 13463-67-7 TiO2 79.9378 g/mol (99%, 99.9%, 99.99%) 30-50nm up to 200µm Powder
Density 4.23 g/cm3
Melting Point 1,843° C (3,349° F)
Boiling Point 2,972° C (5,382° F)

Titanium(IV) Oxide Nanowire

Elements specializes in producing high purity uniform shaped Titanium Oxide Nanowire with the highest possible density for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Metal Wire sizes range from 0.75 mm to 1 mm to 2 mm diameter with strict tolerances and alpha values (conductive resistance) for uses such as gas detection and thermometry tolerances . Please contact us to fabricate custom wire alloys and gauge sizes. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies.

Provide us an opportunity to fulfill all your requirements related to nano-materials Call us at +91-7864020002,+1-518-889-9730 Or Email Us at [email protected]

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