Titanium(IV) Oxide Nanowire
Elements specializes in producing high purity uniform shaped Titanium Oxide Nanowire with the highest possible density for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Metal….
| Titanium(IV) Oxide Nanowire | |
| Product No | NRE-13013 |
| CAS No. | 13463-67-7 |
| Formula | TiO2 |
| Average diameter | 150-200nm |
| Average Length | up to 15um |
| Purity | 99.9% |
| Molecular Weight | 79.9378 g/mol |
| Density | 4.23 g/cm3 |
| Melting Point | 1,843 °C |
| Boiling Point | 2,972 °C |
Titanium(IV) Oxide Nanowire
Elements specialize in producing high purity uniform shaped TiO2 Nanowire with the highest possible density for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low-Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Metal Wire sizes range from 0.75 mm to 1 mm to 2 mm diameter with strict tolerances and alpha values (conductive resistance) for uses such as gas detection and thermometry tolerances. Please contact us to fabricate custom wire alloys and gauge sizes. Materials are produced using crystallization, solid-state, and other ultra high purification processes such as sublimation. Elements specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.
