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Yttrium Aluminum Oxide Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets
Product No NRE-43605
CAS No. NA
Formula YAlO3
Molecular Weight 163.88 g/mol
Purity >99.9%
Density 5.35 g /cm -3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Yttrium Aluminum Oxide Sputtering Targets

Introduction:

Yttrium aluminum oxide sputtering targets, often referred to as YAG, is a ceramic compound combining yttrium, aluminum, and oxygen. Known for its excellent mechanical, thermal, and optical properties, YAG is commonly used in a variety of advanced applications, particularly in electronics, optics, and materials science. As a sputtering target, YAG enables the deposition of high-quality thin films for various innovative technologies.

Applications:

Optical Coatings:

YAG is used in the production of thin films for optical coatings, enhancing properties like reflectivity and transmittance in lenses, mirrors, and other optical components.

Laser Technology:

It serves as a host material for solid-state lasers, particularly in the formulation of laser gain media. YAG is commonly used in neodymium-doped YAG (Nd

lasers, which are widely utilized in medical and industrial applications.

Semiconductors:

YAG sputtering targets are employed in the semiconductor industry for the deposition of thin films in electronic devices, contributing to improved performance and reliability.

Thermal Barrier Coatings:

Used in aerospace and power generation, YAG coatings provide thermal protection to components exposed to high temperatures, enhancing durability and efficiency.

Biomedical Applications:

YAG is utilized in dental and orthopedic implants due to its biocompatibility and mechanical strength, ensuring long-term performance in medical applications.

Ceramic and Composite Materials:

Incorporated into advanced ceramics and composites, YAG enhances mechanical properties and thermal stability.

 

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