Aluminum Fluoride Sputtering Targets
Aluminum Fluoride Sputtering Targets
| Aluminum Fluoride Sputtering Targets | |
| Product No | NRE-43310 |
| CAS No. | 7784-18-1 |
| Formula | AlF3 |
| Molecular Weight | 83.98 |
| Purity | >99.9% |
| Density | 2.88 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Aluminum Fluoride Sputtering Targets
Aluminum fluoride (AlF₃) sputtering targets are used to deposit thin films of aluminum fluoride in various applications due to their unique properties. Here are some common applications:
Optical Coatings
Application: Anti-reflective coatings, optical filters, and lenses.
Benefits: Aluminum fluoride films provide low refractive index coatings that reduce reflection and improve the performance of optical components, enhancing clarity and light transmission.
Anti-Reflective Coatings
Application: Eyeglasses, camera lenses, and displays.
Benefits: AlF₃ coatings are used to reduce glare and improve light transmission in optical devices and consumer products.
Protective Coatings
Application: Corrosion-resistant coatings for various substrates.
Benefits: Aluminum fluoride provides a protective layer that can resist chemical corrosion and extend the life of components in harsh environments.
Dielectric Layers
Application: Capacitors and insulators in electronic devices.
Benefits: Used as dielectric materials due to their insulating properties, aluminum fluoride films improve the performance and reliability of electronic components.
Semiconductor Processing
Application: Etching masks and deposition in semiconductor manufacturing.
Benefits: AlF₃ can be used as an etching mask or in thin film deposition processes, aiding in the creation of precise patterns and structures in semiconductor devices.
Solar Panels
Application: Coatings for photovoltaic cells.
Benefits: Aluminum fluoride coatings can improve the efficiency of solar panels by optimizing light transmission and reducing reflection losses.
Laser Systems
Application: Coatings for laser optics.
Benefits: AlF₃ films are used in laser systems for their low absorption and high durability, enhancing the performance and lifespan of laser optics.
Chemical Vapor Deposition (CVD)
Application: Thin film deposition processes.
Benefits: AlF₃ targets are employed in CVD processes to create thin, uniform films with specific chemical and physical properties for various applications.
