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Bismuth Lutetium Iron Gallate Sputtering Targets

Bismuth Lutetium Iron Gallate Sputtering Targets

Bismuth Lutetium Iron Gallate Sputtering Targets
Product No NRE-43200
CAS No. NA
Formula Bi1.5Lu1.5Fe4GaO12
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm(can be customized)
Diameter 50 mm ± 1mm(can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Bismuth Lutetium Iron Gallate Sputtering Targets

Bismuth lutetium iron gallate (Bi₃Lu₀.₁Fe₀.₈Ga₀.₂O₁₂, often abbreviated as BLFO) sputtering targets are used to deposit thin films of this material, which has specialized properties and applications. Here’s an overview of key product applications for BLFO sputtering targets.

High-Frequency and Microwave Devices:

Application: BLFO is known for its high dielectric constant and low loss characteristics at high frequencies.

Products: Thin films of BLFO are used in high-frequency and microwave components, such as resonators and filters. These devices benefit from the material’s ability to operate efficiently at GHz frequencies, which is crucial for communication systems and electronic devices.

Electronics and Semiconductor Devices:

Application: BLFO thin films are utilized in various electronic and semiconductor applications due to their unique electrical properties.

Products: The material is used in capacitors, varactors, and other electronic components where high dielectric constants and low losses are desired.

Piezoelectric Devices:

Application: BLFO exhibits piezoelectric properties, meaning it can generate an electrical charge in response to mechanical stress.

Products: Thin films of BLFO are employed in piezoelectric actuators and sensors. These devices leverage the material’s ability to convert mechanical energy into electrical energy and vice versa, which is useful in precision control and sensing applications.

Ferroelectric Devices:

Application: BLFO also has ferroelectric properties, which are useful for various memory and data storage applications.

Products: Thin films are used in ferroelectric random-access memory (FeRAM) and other ferroelectric devices. The material’s strong ferroelectric response enhances performance in high-density memory and storage applications.

Material Science Research:

Application: BLFO sputtering targets are used in research to study and develop new materials with specific properties.

Products: Researchers use sputtered BLFO thin films to explore the effects of different deposition conditions and to investigate the material’s behavior in various environments, leading to advancements in material science and technology.

Optical Coatings:

Application: Due to its dielectric properties, BLFO can be used in optical coatings.

Products: Thin films of BLFO are applied in coatings for optical devices where high dielectric constants and low optical losses are beneficial.

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