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Cadmium Sputtering Targets (Cd, Purity: 99.99%, Dia: 50±1mm)
November 6, 2017
Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)
November 6, 2017
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Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)


Constantan Resistance Alloy Sputtering Target

Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)

Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)
Product No. CAS Purity Thickness Diameter Shape Formula Melting Point
NRE-43024 12357-13-0 >99.99% 3 mm ± 0.5mm 50 mm ± 1mm Round CuNi 2031-2255 °F
Molecular Weight 122.239 g/mol
Product Type Sputtering Target
Density 8.5-8.95 g/cm3

Constantan Resistance Alloy Sputtering Target Composition:

Cu

55%

Ni

45%

Constantan Resistance Alloy Sputtering Target

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