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Erbium Sputtering Target

Erbium Sputtering Target

Erbium Sputtering Target
Product No NRE-43049
CAS No. 7440-52-0
Formula Er
Molecular Weight 167.259 g/mol
Purity 99.99%
Density 9.066 g/cm³
Thickness 3 mm ± 0.5mm (can be custommized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Expansion NA

Erbium Sputtering Target

Erbium (Er) sputtering targets are used to deposit thin films of erbium metal, which have a range of specialized applications due to erbium’s unique physical and chemical properties. Here’s a comprehensive look at the applications of erbium sputtering targets.

Optical Devices:

Use: Erbium is commonly used in optical coatings and devices, particularly for creating thin films in lasers and optical amplifiers.

Benefit: Erbium is effective in producing specific wavelengths of light, especially in the near-infrared range (around 1550 nm), which is crucial for telecommunications. Erbium-doped fiber amplifiers (EDFAs) leverage this property to amplify optical signals in fiber optic networks.

Phosphors and Luminescent Materials:

Use: Erbium is utilized in phosphor materials for displays and lighting. It is often doped into host materials to create luminescent compounds.

Benefit: Erbium’s luminescence in the visible and near-infrared spectrum makes it valuable for high-efficiency LEDs, display screens, and other light-emitting devices where precise color output and brightness are required.

Thin Film Transistors (TFTs) and Electronics:

Use: Erbium thin films are used in various electronic devices, including thin-film transistors and other semiconductor applications.

Benefit: Erbium’s properties contribute to the stability and performance of electronic devices, enhancing characteristics such as electrical conductivity and dielectric behavior.

Data Storage and Memory Devices:

Use: In data storage technologies, erbium is used to improve the performance of certain types of memory devices, including phase-change memory (PCM) and other non-volatile memory technologies.

Benefit: Erbium can enhance data storage density and reliability, contributing to more efficient and higher-capacity memory solutions.

High-Temperature Superconductors:

Use: Erbium can be used in the deposition of thin films for high-temperature superconductors, either as a dopant or in combination with other materials.

Benefit: Enhances the superconducting properties of materials by influencing flux pinning and electronic interactions.

Catalysts and Chemical Reactions:

Use: Erbium films are sometimes employed as catalysts or catalyst supports in various chemical reactions.

Benefit: Erbium’s chemical properties can improve the activity and stability of catalytic processes, including those in industrial applications.

Research and Development:

Use: Researchers use erbium sputtering targets to investigate the properties and potential applications of erbium-based materials. This includes studying new materials, developing advanced technologies, and exploring new scientific principles.

Benefit: Supports the development of novel technologies and materials, contributing to advancements in fields such as materials science and nanotechnology.

 

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