Erbium Sputtering Target
Erbium Sputtering Target
Erbium Sputtering Target | |
Product No | NRE-43049 |
CAS No. | 7440-52-0 |
Formula | Er |
Molecular Weight | 167.259 g/mol |
Purity | 99.99% |
Density | 9.066 g/cm³ |
Thickness | 3 mm ± 0.5mm (can be custommized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Expansion | NA |
Erbium Sputtering Target
Erbium (Er) sputtering targets are used to deposit thin films of erbium metal, which have a range of specialized applications due to erbium’s unique physical and chemical properties. Here’s a comprehensive look at the applications of erbium sputtering targets.
Optical Devices:
Use: Erbium is commonly used in optical coatings and devices, particularly for creating thin films in lasers and optical amplifiers.
Benefit: Erbium is effective in producing specific wavelengths of light, especially in the near-infrared range (around 1550 nm), which is crucial for telecommunications. Erbium-doped fiber amplifiers (EDFAs) leverage this property to amplify optical signals in fiber optic networks.
Phosphors and Luminescent Materials:
Use: Erbium is utilized in phosphor materials for displays and lighting. It is often doped into host materials to create luminescent compounds.
Benefit: Erbium’s luminescence in the visible and near-infrared spectrum makes it valuable for high-efficiency LEDs, display screens, and other light-emitting devices where precise color output and brightness are required.
Thin Film Transistors (TFTs) and Electronics:
Use: Erbium thin films are used in various electronic devices, including thin-film transistors and other semiconductor applications.
Benefit: Erbium’s properties contribute to the stability and performance of electronic devices, enhancing characteristics such as electrical conductivity and dielectric behavior.
Data Storage and Memory Devices:
Use: In data storage technologies, erbium is used to improve the performance of certain types of memory devices, including phase-change memory (PCM) and other non-volatile memory technologies.
Benefit: Erbium can enhance data storage density and reliability, contributing to more efficient and higher-capacity memory solutions.
High-Temperature Superconductors:
Use: Erbium can be used in the deposition of thin films for high-temperature superconductors, either as a dopant or in combination with other materials.
Benefit: Enhances the superconducting properties of materials by influencing flux pinning and electronic interactions.
Catalysts and Chemical Reactions:
Use: Erbium films are sometimes employed as catalysts or catalyst supports in various chemical reactions.
Benefit: Erbium’s chemical properties can improve the activity and stability of catalytic processes, including those in industrial applications.
Research and Development:
Use: Researchers use erbium sputtering targets to investigate the properties and potential applications of erbium-based materials. This includes studying new materials, developing advanced technologies, and exploring new scientific principles.
Benefit: Supports the development of novel technologies and materials, contributing to advancements in fields such as materials science and nanotechnology.