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Hafnium Fluoride Powder

Hafnium Fluoride Powder

Hafnium Fluoride Powder
Product No NRE-11112
CAS 13709-52-9
Purity 99.9%
Formula HfF4
APS <40 µm (can be customized)
Color White
Molecular Weight 254.48 g/mol
Density 7.1 g/cm3
Melting Point 1000 °C
Boiling Point 970 °C

Hafnium Fluoride Powder

Hafnium fluoride (HfF4) is a chemical compound that finds several applications in different fields due to its unique properties. Some of its applications include:

Optical Coatings: Hafnium fluoride is used as an optical coating material due to its high refractive index and low dispersion properties. It is employed in the production of anti-reflective coatings and other optical components, especially in the ultraviolet (UV) range.

Semiconductor Manufacturing: Hafnium fluoride powder is utilized in the production of semiconductors, specifically in the process of etching and cleaning silicon wafers. It can be used as a precursor in the fabrication of microelectronic devices.

Plasma Etching: Hafnium fluoride is employed in plasma etching processes, particularly in the manufacturing of integrated circuits. It is used as an etchant for various materials, helping to precisely carve patterns onto semiconductor surfaces.

Nuclear Reactors: Hafnium is known for its exceptional neutron-absorbing capabilities, and hafnium fluoride is used as a control material in nuclear reactors. It helps regulate the fission reactions and maintain the stability of nuclear reactors.

Aerospace Industry: Hafnium fluoride is also used in the aerospace industry, primarily in the production of high-temperature ceramic composites and coatings for components exposed to extreme heat, such as rocket nozzles and thermal protection systems.

Catalysts: Hafnium fluoride can be utilized as a catalyst in various chemical reactions due to its Lewis acidic properties. It finds applications in organic synthesis and other catalytic processes.