Hafnium Iron Alloy Sputtering Targets
Hafnium Iron Alloy Sputtering Targets
| Hafnium Iron Alloy Sputtering Targets | |
| Product No | NRE-43440 |
| CAS No. | NA |
| Formula | Hf-Fe |
| Molecular Weight | NA |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Hafnium Iron Alloy Sputtering Targets
Hafnium-iron alloy sputtering targets are used in various advanced applications, primarily due to their unique properties. Here are some key applications.
Microelectronics: Hafnium is commonly used in high-k dielectric materials, while iron can enhance magnetic properties. Together, they are utilized in semiconductor devices to create thin films that improve performance.
Magnetic Storage: The alloy can be used in the production of magnetic films for hard drives and other storage devices, enhancing data retention and read/write speeds.
Protective Coatings: The combination can provide excellent corrosion resistance and wear protection, making it suitable for various industrial applications.
Optoelectronics: Hafnium’s optical properties make these alloys useful in optoelectronic devices, including sensors and photodetectors.
Research and Development: Hafnium-iron alloys are also studied for their unique magnetic and structural properties, making them a subject of interest in materials science research.
These applications leverage the beneficial properties of both hafnium and iron, including high thermal stability, corrosion resistance, and favorable electronic characteristics. If you have a specific application in mind, let me know!
