Hafnium Nitride Sputtering Targets
Hafnium Nitride Sputtering Targets
| Hafnium Nitride Sputtering Targets | |
| Product No | NRE-43221 |
| CAS No. | 25817-87-2 |
| Formula | HfN |
| Molecular Weight | 192.5 |
| Purity | >99.9% |
| Density | 13800 kg/m-3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Hafnium Nitride Sputtering Targets
Introduction
Hafnium nitride (HfN) sputtering targets are materials used to deposit hafnium nitride thin films through the sputtering process. HfN is known for its exceptional hardness, thermal stability, and high melting point, making it an attractive choice for various advanced applications.
Applications
Hard Coatings:
HfN is commonly used to produce hard coatings for cutting tools, industrial machinery, and wear-resistant surfaces. These coatings enhance durability and performance under extreme conditions.
Electronics:
In semiconductor manufacturing, hafnium nitride is utilized in gate dielectrics and as a barrier layer in interconnects. Its high dielectric constant helps improve device performance and reduce leakage currents.
Optical Coatings:
HfN thin films can be applied in optical coatings for mirrors and lenses, providing reflective and anti-reflective properties that enhance optical performance.
Protective Layers:
Due to its chemical resistance and thermal stability, HfN is used as a protective layer in harsh environments, such as aerospace applications or chemical processing equipment.
Research and Development:
Hafnium nitride targets are valuable in material science research, allowing for the exploration of new properties and functionalities in thin film technologies.
