Hafnium Oxide Powder

Hafnium Oxide Powder

Hafnium oxide (HfO2) is a sort of wideband hole and high dielectric steady of fired materials. Hafnia is utilized as a part of optical coatings, and as a high-k dielectric in DRAM capacitors, future coordinated circuits, as a hard-headed material. Hafnium oxide (HfO2) has been widely examined as a potential contrasting option to silicon dioxide because of its high dielectric consistent and generally high warm dependability as for a silicon surface. Hafnium(IV) oxide is the inorganic compound with the recipe HfO2. Otherwise called hafnia, this drab strong is a standout amongst the most widely recognized and stable mixes of hafnium. It is an electrical protector with a band hole of roughly 6 eV. Hafnium dioxide is a middle of the road in a few procedures that give hafnium metal. Hafnium(IV) oxide is very dormant. It responds with solid acids, for example, concentrated sulfuric corrosive and with solid bases. It breaks down gradually in hydrofluoric corrosive to give fluorohafnate anions. At hoisted temperatures, it responds with chlorine within the sight of graphite or carbon tetrachloride to give hafnium tetrachloride.