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Cesium Chloride Fine Powder
Cesium Chloride Fine Powder (CsCl, Purity: 99.9%, APS: 40-50µm)
November 7, 2017
Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)
November 7, 2017
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Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)


Hafnium Oxide Sputtering Target

Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)

 Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)
Product No. CAS Purity Thickness Diameter Shape Young’s Modulus Melting Point
NRE-43038 12055-23-1 >99.99% 3 mm ± 0.5mm 50 mm ± 1mm Round 57 GPa 2758 °C
Molecular Weight 210.49 g/mol
Molecular Formula HfO2
Density 9.68 g/cm³

Hafnium Oxide Sputtering Target

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