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Indium Aluminum Zinc Oxide Sputtering Targets

Indium Aluminum Zinc Oxide Sputtering Targets

Indium Aluminum Zinc Oxide Sputtering Targets
Product No NRE-43222
CAS No. NA
Formula In2O3/Al2O3/ZnO
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Indium Aluminum Zinc Oxide Sputtering Targets

Introduction

Indium Aluminum Zinc Oxide (IAZO) sputtering targets are materials composed of indium, aluminum, zinc, and oxygen, used to deposit IAZO thin films via sputtering techniques. IAZO is a type of transparent conducting oxide (TCO) known for its excellent electrical conductivity, optical transparency, and thermal stability. These properties make IAZO a versatile material for various advanced applications in electronics and optoelectronics.

Applications

Transparent Conductive Films:

IAZO is widely used to produce transparent conductive films for applications in touch screens, displays (LCD and OLED), and solar cells. Its high conductivity and transparency make it ideal for these technologies.

Solar Cells:

IAZO thin films are utilized as window layers in thin-film solar cells, helping to enhance light absorption while allowing for efficient charge transport.

Flat Panel Displays:

In LCD and OLED displays, IAZO serves as an electrode material, providing both conductivity and optical transparency, which is critical for display performance.

Gas Sensors:

IAZO is explored in gas sensor applications due to its sensitivity to various gases, offering potential for environmental monitoring and industrial safety.

Flexible Electronics:

The material’s properties enable its use in flexible and lightweight electronic devices, making it suitable for applications in wearable technology.

Research and Development:

IAZO sputtering targets are valuable in material science research, allowing scientists to investigate new properties and develop advanced thin film technologies for various applications.

In summary, Indium Aluminum Zinc Oxide sputtering targets play a crucial role in advancing electronics and optoelectronics, enabling the deposition of high-quality thin films that meet the demands of modern technological applications.

 

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