Indium Oxide Sputtering Target
Indium Oxide Sputtering Target
Indium Oxide Sputtering Target | |
Product No | NRE-43068 |
CAS No. | 1312-43-2 |
Formula | In2O3 |
Molecular Weight | 277.64 g/mol |
Purity | 99.9% |
Density | 7.18 g/cm3 |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Electrical Resistivity | NA |
Electronegativity | NA |
Indium Oxide Sputtering Target
Introduction
Indium oxide (In₂O₃) sputtering target are essential materials used for the deposition of thin films in various electronic, optical, and optoelectronic applications. Indium oxide is a wide-bandgap semiconductor that exhibits unique properties, such as high transparency and electrical conductivity, making it a popular choice in modern technologies.
Applications:
Transparent Conductive Oxides (TCOs): Indium oxide is commonly used as a TCO in applications such as flat-panel displays, touchscreens, and solar cells, where both transparency and conductivity are crucial.
Thin-Film Transistors (TFTs): Indium oxide is a key component in TFT technology, particularly in liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), enabling high-resolution imaging.
Solar Cells: As a TCO, indium oxide enhances the efficiency of photovoltaic cells by providing a conductive layer that allows light to penetrate while conducting electricity.
Sensors: Indium oxide is used in gas sensors and other sensing devices due to its semiconducting properties, which can change in response to environmental conditions.
Optoelectronics: Its properties make it suitable for use in LEDs and laser diodes, contributing to the development of advanced lighting and display technologies.