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Indium Oxide Sputtering Target

Indium Oxide Sputtering Target

Indium Oxide Sputtering Target
Product No NRE-43068
CAS No. 1312-43-2
Formula In2O3
Molecular Weight 277.64 g/mol
Purity 99.9%
Density 7.18 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Electrical Resistivity NA
Electronegativity NA

Indium Oxide Sputtering Target

Introduction

Indium oxide (In₂O₃) sputtering target are essential materials used for the deposition of thin films in various electronic, optical, and optoelectronic applications. Indium oxide is a wide-bandgap semiconductor that exhibits unique properties, such as high transparency and electrical conductivity, making it a popular choice in modern technologies.

Applications:

Transparent Conductive Oxides (TCOs): Indium oxide is commonly used as a TCO in applications such as flat-panel displays, touchscreens, and solar cells, where both transparency and conductivity are crucial.

Thin-Film Transistors (TFTs): Indium oxide is a key component in TFT technology, particularly in liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), enabling high-resolution imaging.

Solar Cells: As a TCO, indium oxide enhances the efficiency of photovoltaic cells by providing a conductive layer that allows light to penetrate while conducting electricity.

Sensors: Indium oxide is used in gas sensors and other sensing devices due to its semiconducting properties, which can change in response to environmental conditions.

Optoelectronics: Its properties make it suitable for use in LEDs and laser diodes, contributing to the development of advanced lighting and display technologies.

 

 

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