Iron Cobalt Boron Alloy Sputtering Targets | |
Product No | NRE-43460 |
CAS No. | NA |
Formula | Fe-Co-B |
Molecular Weight | NA |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Iron Cobalt Boron Alloy Sputtering Targets
Iron-cobalt-boron (Fe-Co-B) alloy sputtering targets are utilized in various applications due to their unique combination of magnetic properties, mechanical strength, and corrosion resistance. Here are some key applications.
Magnetic Materials
Permanent Magnets: Fe-Co-B alloys are often used in the production of high-performance permanent magnets, which are essential in electric motors, generators, and speakers due to their strong magnetic properties.
Magnetic Sensors: Employed in sensitive magnetic field sensors, benefiting from their excellent magnetization characteristics.
Data Storage Devices
Hard Drives and Magnetic Tapes: These alloys are used to create thin films in data storage applications, enhancing the performance and density of magnetic recording media.
Electronics
Inductors and Transformers: Fe-Co-B sputtered films are utilized in inductors and transformers for their superior magnetic permeability, improving efficiency in power conversion applications.
Biomedical Applications
MRI Technology: Fe-Co-B alloys can be used in components for magnetic resonance imaging (MRI), enhancing the imaging quality through improved magnetic characteristics.
Magnetic Implants: The alloys can also be applied in certain biomedical devices where magnetic properties are advantageous.
Wear-Resistant Coatings
Cutting Tools: Sputtered coatings of Fe-Co-B enhance the wear resistance and toughness of cutting tools, extending their lifespan and performance in machining processes.
Research and Development
Fe-Co-B targets are valuable in research settings for developing new magnetic materials and exploring their potential applications in nanotechnology and advanced electronics.