Lanthanum Boride Sputtering Targets
Lanthanum Boride Sputtering Targets
Lanthanum Boride Sputtering Targets | |
Product No | NRE-43471 |
CAS No. | 12008-21-8 |
Formula | LaB6 |
Molecular Weight | 203.78 |
Purity | >99.9% |
Density | 4.72 g/cm3 |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Lanthanum Boride Sputtering Targets
Introduction
Lanthanum Boride (LaB₆) is a refractory compound that exhibits exceptional thermal and electrical conductivity, making it a material of interest in various high-performance applications. Known for its stability at high temperatures and resistance to oxidation, lanthanum boride is primarily used in the production of sputtering targets for thin film deposition.
Applications
Thin Film Coatings: LaB₆ is utilized to create high-quality thin films for various applications, including wear-resistant coatings, electrical contacts, and protective layers. Its hardness and durability enhance the lifespan and performance of components.
Electron Emitters: Due to its high electron emission efficiency, lanthanum boride is employed in cathodes for electron guns and vacuum tubes, which are crucial in various electronic and display technologies.
Semiconductor Manufacturing: LaB₆ sputtering targets are used to deposit films that are essential in the semiconductor industry, contributing to the fabrication of microelectronic devices.
Optical Coatings: The optical properties of LaB₆ make it suitable for applications in optical coatings, enhancing the performance of lenses and mirrors by providing high durability and reflection.
Plasma Processing: In plasma processing applications, lanthanum boride targets can improve the efficiency of chemical vapor deposition (CVD) and other plasma-enhanced deposition techniques.
Sputtering Process
The sputtering process for lanthanum boride involves bombarding a LaB₆ target with energetic ions, which dislodge atoms that then deposit onto a substrate. This technique allows for precise control over the film’s composition and thickness, making it ideal for high-performance applications.