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Lanthanum Copper Oxide Sputtering Targets

Lanthanum Copper Oxide Sputtering Targets

Lanthanum Copper Oxide Sputtering Targets
Product No NRE-43229
CAS No. NA
Formula La2CuO4
Molecular Weight 405.35
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Lanthanum Copper Oxide Sputtering Targets

Introduction

Lanthanum copper oxide (La2CuO4) is a compound known for its high-temperature superconducting properties, making it a valuable material in various technological applications. Sputtering targets made from lanthanum copper oxide are used in thin film deposition processes, particularly for producing high-quality films in electronic, optoelectronic, and superconducting applications.

Applications

Superconductors:

High-Temperature Superconductors: La2CuO4 is a fundamental component in the family of high-temperature superconductors (HTS). Films produced from sputtering targets are crucial for applications in magnetic resonance imaging (MRI), particle accelerators, and power transmission.

Electronics:

Thin Film Transistors (TFTs): Used in display technologies, sputtered La2CuO4 films can improve the performance and efficiency of TFTs.

Capacitors and Inductors: Thin films of lanthanum copper oxide can enhance the performance of electronic components due to their unique electrical properties.

Optoelectronics:

Photovoltaics: Sputtered La2CuO4 films can be employed in solar cells to enhance light absorption and energy conversion efficiency.

Laser Technology: The material’s properties may be leveraged in the development of lasers and other optoelectronic devices.

Catalysis:

Catalytic Applications: La2CuO4 can serve as a catalyst in various chemical reactions, and thin films can improve surface area and reactivity.

Memory Devices:

Resistive Switching Devices: La2CuO4 is explored for its potential in non-volatile memory applications, where its resistive switching properties can be utilized.

 

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