Molybdenum Monoxide Sputtering Targets

Molybdenum Monoxide Sputtering Targets

Introduction

Molybdenum monoxide (MoO) sputtering targets are specialized materials used in physical vapor deposition (PVD) processes to produce thin films of molybdenum oxide. The monoxide form, specifically MoO, combines molybdenum with oxygen in a stoichiometric ratio that imparts distinct electrical and optical properties to the resulting films.

Properties of Molybdenum Monoxide

Electrical Conductivity: MoO can exhibit metallic conductivity, which is beneficial for various electronic applications.

Optical Properties: The film can be manipulated to provide specific optical characteristics, making it useful in optoelectronic applications.

Thermal Stability: Molybdenum monoxide is thermally stable, maintaining its properties at elevated temperatures.

Applications of Molybdenum Monoxide Sputtering Targets

Electronics:

Thin Film Transistors (TFTs): Used as a channel material in TFTs, which are crucial components in display technology.

Interconnects: MoO films can serve as conductive layers in integrated circuits.

Optoelectronics:

Solar Cells: Molybdenum oxide can be used in the fabrication of transparent conductive layers, enhancing the efficiency of solar cells.

Sensors: Films of MoO are used in various sensors due to their semiconducting properties.

Catalysis:

Molybdenum oxides, including MoO, are investigated for catalytic applications, particularly in oxidation reactions and in fuel cells.

Protective Coatings:

MoO films can serve as protective coatings in harsh environments, providing resistance to oxidation and wear.

Magnetic Materials:

Certain molybdenum oxides can exhibit interesting magnetic properties, making them suitable for use in magnetic sensors and data storage devices.