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Nickel Antimonide Sputtering Targets

Nickel Antimonide Sputtering Targets

Nickel Antimonide Sputtering Targets
Product No NRE-43514
CAS No. 12035-52-8
Formula NiSb
Molecular Weight 180.45 g/mol
Purity >99.9%
Density 8.56 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Nickel Antimonide Sputtering Targets

Introduction:

Nickel antimonide (NiSb) is an intermetallic compound formed from nickel and antimony. It exhibits unique physical and chemical properties, including good electrical conductivity, thermoelectric characteristics, and structural stability. Due to these properties, nickel antimonide is of significant interest in various technological applications, particularly in the fields of thermoelectrics, electronics, and magnetics.

Applications:

Thermoelectric Devices: NiSb is used in thermoelectric materials, which can convert temperature differences into electrical voltage. This property makes it suitable for applications in power generation and refrigeration.

Thin Film Electronics: Sputtering targets made from NiSb are employed to create thin films for electronic components, benefiting from the alloy’s conductivity and stability.

Magnetic Materials: Nickel antimonide has magnetic properties that can be utilized in sensors and magnetic devices, particularly in applications requiring specific magnetic behaviors.

Sensor Technology: NiSb thin films can be used in various sensors, including temperature and pressure sensors, due to their responsive electrical properties.

Catalysts: The unique properties of nickel antimonide can be explored in catalytic applications, especially in chemical processes requiring effective catalytic materials.

Research and Development: NiSb is often used in academic and industrial research to explore new applications in electronics, thermoelectrics, and materials science.

 

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