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Silicon Oxide Sputtering Target
Silicon Oxide Sputtering Target (SiO2, Purity: 99.99%, Dia: 50±1mm)
November 6, 2017
Caffeic Acid
Caffeic Acid (C9H8O4, Purity: 99%)
November 6, 2017
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Silicon Nitride Sputtering Target (Si3N4, Purity: 99.99%, Dia: 50±1mm)


Silicon Oxide Sputtering Target

Silicon Nitride Sputtering Target (Si3N4, Purity: 99.99%, Dia: 50±1mm)

Silicon Oxide Sputtering Target (SiO2, Purity: 99.99%, Dia: 50±1mm)
Product No. CAS Purity Thickness Diameter Shape Appearance Density
NRE-43055 12033-89-5 >99.9% 3 mm ± 0.5mm 50 mm ± 1mm Round Silvery 3.2 g/cm³
Molecular Weight 140.28 g/mol
Melting Point 1900 °C
Boiling Point NA

Silicon Nitride Sputtering Target

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