Titanium Monoxide Sputtering Targets
Titanium Monoxide Sputtering Targets
| Titanium Monoxide Sputtering Targets | |
| Product No | NRE-43285 |
| CAS No. | 12137-20-1 |
| Formula | TiO |
| Molecular Weight | 63.866 g/mol |
| Purity | >99.9% |
| Density | 4.95 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Titanium Monoxide Sputtering Targets
Introduction:
Titanium monoxide sputtering targets is a titanium oxide compound that exhibits interesting properties, including electrical conductivity and catalytic activity. This material is of growing interest in various technological applications due to its unique characteristics. Titanium monoxide sputtering targets are used to deposit thin films of TiO onto substrates through sputtering, allowing for precise control over the film’s composition, thickness, and microstructure.
Applications
Thin-Film Transistors (TFTs):
Titanium monoxide is utilized in the production of thin-film transistors, especially in display technologies, where its electrical properties can enhance performance.
Electrodes in Energy Storage:
TiO can be used as an electrode material in batteries and supercapacitors, contributing to improved energy storage capacity and efficiency.
Catalysis:
Titanium monoxide exhibits catalytic properties, making it suitable for applications in chemical reactions and processes, including photocatalysis for environmental remediation.
Protective Coatings:
TiO thin films can serve as protective coatings on various substrates, enhancing wear resistance and durability, particularly in harsh environments.
Electrical Contacts:
Due to its conductivity, TiO is explored for use in electrical contacts and connectors, where reliable performance is essential.
Optical Coatings:
Titanium monoxide can be applied in optical applications, offering potential benefits such as anti-reflective properties or functional coatings for lenses and mirrors.
Surface Engineering:
TiO films are used in surface engineering to modify the surface characteristics of materials, improving their performance in demanding applications.
Sputtering Process
The sputtering process for titanium monoxide involves using a TiO target in a vacuum chamber. Energetic ions bombard the target, dislodging titanium and oxygen atoms that are then deposited onto a substrate to form a thin film.
