Vanadium Sputtering Target
Vanadium Sputtering Target
Vanadium Sputtering Target | |
Product No | NRE-43173 |
CAS No. | 7440-62-2 |
Formula | V |
Molecular Weight | 50.94 g/mol |
Purity | 99.99% |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Vanadium Sputtering Target
Introduction:
Vanadium sputtering target is a transition metal known for its unique properties, including good electrical conductivity, high corrosion resistance, and strength. It is commonly used in various applications, especially in the fields of metallurgy, electronics, and materials science. Sputtering targets made from vanadium are utilized in physical vapor deposition (PVD) processes to produce thin films with specific characteristics, making them valuable in numerous advanced technological applications.
Applications
Hard Coatings: Vanadium sputtering targets are often used to produce hard coatings for cutting tools and industrial machinery. These coatings enhance wear resistance and extend the lifespan of tools in demanding environments.
Semiconductor Devices: Vanadium films are employed in semiconductor applications, including interconnects and contacts, due to their good electrical conductivity and stability.
Superconducting Materials: Vanadium is used in the production of superconducting materials, which are critical for applications in MRI machines, particle accelerators, and other advanced technologies.
Magnetic Applications: Vanadium can be utilized in the fabrication of magnetic materials and components, contributing to applications in sensors and electronic devices.
Energy Storage: Research is ongoing into the use of vanadium in batteries and supercapacitors, where its properties can enhance energy storage performance.
Research and Development: Vanadium sputtering targets are widely used in laboratories for material research, studies on thin film technologies, and the development of new materials.