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Vanadium Tungsten Alloy Sputtering Targets

Vanadium Tungsten Alloy Sputtering Targets

Vanadium Tungsten Alloy Sputtering Targets
Product No NRE-43603
CAS No. NA
Formula V-W
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Vanadium Tungsten Alloy Sputtering Targets

Vanadium tungsten alloy sputtering targets are specialized materials often used in the manufacturing of sputtering targets for various applications in thin film deposition. These alloys combine the properties of vanadium, known for its strength and corrosion resistance, with tungsten, which boasts high melting points and excellent thermal conductivity. This combination results in a material that both durable and effective in various high-temperature and high-stress environments.

Applications:

Semiconductor Manufacturing:

Used for the deposition of thin films in semiconductor devices, where precise control of film properties is crucial.

Optical Coatings:

Employed in the production of optical components such as mirrors and lenses, providing reflective and anti-reflective coatings.

Solar Cells:

Utilized in the fabrication of photovoltaic cells, enhancing efficiency through improved conductive and optical properties.

Wear-Resistant Coatings:

Applied to tools and machinery to improve wear resistance and extend the lifespan of components.

Biomedical Applications:

Involved in the deposition of biocompatible coatings for medical devices, enhancing compatibility and performance.

Hard Coatings:

Used for hard films in various applications, providing enhanced durability and performance in harsh environments.

 

 

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