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Ytterbium Fluoride Sputtering Target

Ytterbium Fluoride Sputtering Target

Ytterbium Fluoride Sputtering Target
Product No NRE-43174
CAS No. 13760-80-0
Formula YbF3
Molecular Weight 230.04 g/mol
Purity >99 %
Density 8.2 g/cm³
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Ytterbium Fluoride Sputtering Target

Introduction:

Ytterbium fluoride sputtering target is a compound of the rare earth element ytterbium, known for its unique optical and electronic properties. As a sputtering target, ytterbium fluoride is used in thin film deposition processes, particularly in applications requiring specific optical characteristics. YbF₃ has gained attention for its potential in various advanced technologies due to its stability and effectiveness in forming high-quality films.

Applications

Optical Coatings:

Used in the production of anti-reflective and reflective coatings for lenses, mirrors, and other optical components. The unique optical properties of YbF₃ can enhance light transmission and minimize losses.

Laser Technology:

Employed in the fabrication of laser components, particularly in solid-state lasers. YbF₃ can serve as a host material for laser-doping, improving performance and efficiency.

Electronic Devices:

Utilized in the production of thin films for electronic applications, including capacitors and sensors. The material’s dielectric properties make it suitable for these uses.

Photovoltaic Cells:

Applied in solar cell technology to improve efficiency through the optimization of light absorption and conversion processes.

Thin Film Transistors:

Used in the manufacturing of thin film transistors (TFTs) for display technologies, where high-quality, uniform films are essential for performance.

 

 

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