Ytterbium Fluoride Sputtering Target
Ytterbium Fluoride Sputtering Target
Ytterbium Fluoride Sputtering Target | |
Product No | NRE-43174 |
CAS No. | 13760-80-0 |
Formula | YbF3 |
Molecular Weight | 230.04 g/mol |
Purity | >99 % |
Density | 8.2 g/cm³ |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Ytterbium Fluoride Sputtering Target
Introduction:
Ytterbium fluoride sputtering target is a compound of the rare earth element ytterbium, known for its unique optical and electronic properties. As a sputtering target, ytterbium fluoride is used in thin film deposition processes, particularly in applications requiring specific optical characteristics. YbF₃ has gained attention for its potential in various advanced technologies due to its stability and effectiveness in forming high-quality films.
Applications
Optical Coatings:
Used in the production of anti-reflective and reflective coatings for lenses, mirrors, and other optical components. The unique optical properties of YbF₃ can enhance light transmission and minimize losses.
Laser Technology:
Employed in the fabrication of laser components, particularly in solid-state lasers. YbF₃ can serve as a host material for laser-doping, improving performance and efficiency.
Electronic Devices:
Utilized in the production of thin films for electronic applications, including capacitors and sensors. The material’s dielectric properties make it suitable for these uses.
Photovoltaic Cells:
Applied in solar cell technology to improve efficiency through the optimization of light absorption and conversion processes.
Thin Film Transistors:
Used in the manufacturing of thin film transistors (TFTs) for display technologies, where high-quality, uniform films are essential for performance.