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Zirconium Boride Alloy Sputtering Targets

Zirconium Boride Alloy Sputtering Targets

Zirconium Boride Alloy Sputtering Targets
Product No NRE-43615
CAS No. 12045-64-6
Formula ZrB2
Molecular Weight 112.85 g/mol
Purity >99.9%
Density 6.085 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Zirconium Boride Alloy Sputtering Targets

Introduction

Zirconium boride alloy sputtering targets is a refractory compound known for its excellent hardness, thermal stability, and resistance to oxidation. When alloyed, zirconium boride can enhance certain properties, making it suitable for various advanced applications. Sputtering targets made from zirconium boride alloys are particularly valuable in thin-film deposition processes, such as those used in semiconductor manufacturing, optics, and protective coatings.

Applications

Semiconductor Industry:

Used to deposit thin films for interconnects, capacitors, and gate materials in microelectronics.

Provides excellent electrical properties and thermal stability.

Optical Coatings:

Utilized for hard coatings in optics to improve scratch resistance and durability.

Suitable for anti-reflective coatings and mirrors due to its high refractive index.

Protective Coatings:

Employed in protective layers for components exposed to high temperatures or corrosive environments.

Enhances wear resistance and extends the lifespan of tools and machinery.

Aerospace and Defense:

Used in applications requiring materials with high thermal conductivity and low weight.

Ideal for thermal barrier coatings in jet engines and other high-temperature applications.

Nanotechnology:

Supports the development of nanostructured materials, where controlled deposition is critical for fabricating nanoscale devices.

 

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