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Zirconium Carbide Sputtering Targets

Zirconium Carbide Sputtering Targets

Zirconium Carbide Sputtering Targets
Product No NRE-43297
CAS No. 12070-14-3
Formula ZrC
Molecular Weight 103.23
Purity >99.9%
Density 6.73 g/cm3 (24 °C)
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Zirconium Carbide Sputtering Targets

Introduction

Zirconium carbide sputtering targets is a ceramic material known for its exceptional hardness, high melting point, and thermal stability. These properties make it an ideal candidate for use in sputtering targets, which are essential for thin-film deposition processes in various high-tech applications. Zirconium carbide is particularly valued in environments where wear resistance and thermal performance are critical.

Applications

Wear-Resistant Coatings:

ZrC is used to create hard coatings for tools and components that experience high friction and wear, enhancing their durability.

Thermal Barrier Coatings:

Employed in aerospace applications to protect components from extreme temperatures, such as in jet engines and turbine blades.

Semiconductor Manufacturing:

Used in the deposition of thin films for interconnects and gate electrodes, offering excellent electrical properties and reliability.

Optical Coatings:

Suitable for coatings that require high hardness and scratch resistance, used in lenses and protective covers.

Plasma Facing Materials:

Utilized in fusion reactors and other high-temperature applications due to its thermal stability and resistance to erosion.

Biomedical Applications:

Investigated for biocompatible coatings in medical implants, where durability and corrosion resistance are essential.

Nanotechnology:

Used in the fabrication of nanoscale devices, benefiting from the precise deposition control that sputtering allows.

 

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