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Aluminum Neodymium Alloy Sputtering Targets

Aluminum Neodymium Alloy Sputtering Targets

Aluminum Neodymium Alloy Sputtering Targets
Product No NRE-43312
CAS No. NA
Formula Al-Nd
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Aluminum Neodymium Alloy Sputtering Targets

Aluminum neodymium (Al-Nd) alloy sputtering targets are used to deposit thin films with specific magnetic and structural properties. Neodymium, a rare-earth element, imparts unique characteristics to the alloy that are valuable in several advanced applications. Here’s a breakdown of the key product applications for Al-Nd sputtering targets:

Applications of Aluminum Neodymium Sputtering Targets

Magnetic Thin Films:

Magnetic Recording Media: Al-Nd thin films can be used in the production of magnetic recording media, including hard drives and other data storage devices. The neodymium component enhances the magnetic properties of the film, which is crucial for high-density data storage.

Magnetic Sensors: These films are used in the fabrication of magnetic sensors, which are employed in various applications such as automotive sensors, industrial monitoring, and consumer electronics.

Magnetic Materials:

Permanent Magnets: Al-Nd alloys can be used in the manufacturing of permanent magnets, where the combination of aluminum and neodymium provides high magnetic strength and stability. These magnets are used in various applications, including electric motors, generators, and magnetic couplings.

Magnetic Coatings: Al-Nd sputtered thin films can be used as magnetic coatings for various substrates, enhancing their magnetic properties for specific applications.

Optical Coatings:

Reflective Coatings: In optical systems, Al-Nd films can be used as reflective coatings. The alloy’s specific optical properties can be tailored to enhance reflectivity or to create specialized optical filters.

Anti-Reflective Coatings: The sputtered films can also be used in anti-reflective coatings to improve the performance of optical devices by reducing glare and enhancing light transmission.

Electronic and Semiconductor Devices:

High-Performance Thin-Film Transistors: Al-Nd sputtering targets can be used to deposit thin films in high-performance electronic devices, including thin-film transistors (TFTs) used in displays and other electronics.

Conductive Films: These films can be employed as conductive layers in various electronic applications where enhanced conductivity and stability are required.

Catalysis and Chemical Reactions:

Catalytic Coatings: Al-Nd thin films may be used as catalytic coatings in chemical processes. The unique properties of the neodymium component can enhance the catalytic activity and stability of the coating.

 

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