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Gd6FeBi2 Sputtering Targets

Gd6FeBi2 Sputtering Targets

Gd6FeBi2 Sputtering Targets
Product No NRE-43427
CAS No. NA
Formula Gd6FeBi2
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Gd6FeBi2 Sputtering Targets

Introduction

Gd6FeBi2 Sputtering Targets is a compound consisting of gadolinium (Gd), iron (Fe), and bismuth (Bi), known for its unique magnetic and electronic properties. Sputtering targets made from this material are used in thin-film deposition processes, particularly in the fabrication of advanced electronic, magnetic, and optoelectronic devices.

Applications

Magnetic Materials:

Gd6FeBi2 exhibits strong magnetocrystalline anisotropy, making it suitable for applications in high-density magnetic storage devices and magnetic sensors.

Spintronics:

The compound’s properties can be exploited in spintronic devices, which utilize the electron’s spin for data storage and transfer, potentially leading to faster and more efficient devices.

Thermoelectric Devices:

With its good thermoelectric properties, Gd6FeBi2 can be used in energy conversion applications, helping to convert temperature differences into electrical energy.

Optoelectronics:

The material can also find applications in optoelectronic devices, such as light-emitting diodes (LEDs) and lasers, due to its semiconducting properties.

Sensors:

The unique magnetic and electrical properties can be harnessed in various types of sensors, improving the sensitivity and efficiency of detection systems.

 

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