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Manganese Sulfide Sputtering Targets

Manganese Sulfide Sputtering Targets

Manganese Sulfide Sputtering Targets
Product No NRE-43495
CAS No. 12125-23-4
Formula MnS2
Molecular Weight 119.068
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Manganese Sulfide Sputtering Targets

Introduction:

Manganese sulfide sputtering targets are key materials used in the deposition of thin films for various applications in electronics and materials science. MnS is a semiconductor compound known for its interesting electrical, optical, and magnetic properties, making it suitable for a range of advanced technological applications.

Applications:

Semiconductor Devices:

MnS is utilized in the fabrication of thin films for semiconductor devices such as diodes and transistors, benefiting from its semiconductor characteristics and suitable bandgap.

Optoelectronic Applications:

Used in the production of photodetectors and light-emitting devices (LEDs), manganese sulfide enhances the efficiency of light absorption and emission, which is crucial for optoelectronic components.

Solar Energy:

Employed in thin-film solar cells, MnS acts as a light-absorbing layer, contributing to improved energy conversion efficiencies in photovoltaic technologies.

Magnetic Materials:

Manganese sulfide can be utilized in magnetic applications and spintronics, taking advantage of its magnetic properties for advanced data storage solutions.

Catalysis:

MnS serves as a catalyst in various chemical reactions, including environmental applications like gas sensors and catalytic converters, where its unique properties can enhance reaction efficiency.

 

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