Manganese Sulfide Sputtering Targets
Manganese Sulfide Sputtering Targets
Manganese Sulfide Sputtering Targets | |
Product No | NRE-43495 |
CAS No. | 12125-23-4 |
Formula | MnS2 |
Molecular Weight | 119.068 |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Manganese Sulfide Sputtering Targets
Introduction:
Manganese sulfide sputtering targets are key materials used in the deposition of thin films for various applications in electronics and materials science. MnS is a semiconductor compound known for its interesting electrical, optical, and magnetic properties, making it suitable for a range of advanced technological applications.
Applications:
Semiconductor Devices:
MnS is utilized in the fabrication of thin films for semiconductor devices such as diodes and transistors, benefiting from its semiconductor characteristics and suitable bandgap.
Optoelectronic Applications:
Used in the production of photodetectors and light-emitting devices (LEDs), manganese sulfide enhances the efficiency of light absorption and emission, which is crucial for optoelectronic components.
Solar Energy:
Employed in thin-film solar cells, MnS acts as a light-absorbing layer, contributing to improved energy conversion efficiencies in photovoltaic technologies.
Magnetic Materials:
Manganese sulfide can be utilized in magnetic applications and spintronics, taking advantage of its magnetic properties for advanced data storage solutions.
Catalysis:
MnS serves as a catalyst in various chemical reactions, including environmental applications like gas sensors and catalytic converters, where its unique properties can enhance reaction efficiency.