Nd1-xSrxNiO2 Sputtering Targets

Nd1-xSrxNiO2 Sputtering Targets

Introduction

Nd1-xSrxNiO2 Sputtering Targets is a type of perovskite oxide that incorporates neodymium (Nd), strontium (Sr), and nickel (Ni) in its structure. This material has gained attention for its potential applications in various fields, particularly in electronics and materials science. Sputtering targets made from Nd1-xSrxNiO2 are used to create thin films with specific properties that are valuable for different technological applications.

Properties of Nd1-xSrxNiO2

Superconductivity: Depending on the composition (value of x), Nd1-xSrxNiO2 can exhibit superconducting properties, making it of interest for applications in advanced electronic devices.

Conductivity: This material can possess good electrical conductivity, which is essential for various electronic applications.

Thermal Stability: Nd1-xSrxNiO2 exhibits good thermal stability, which is beneficial for processes requiring high temperatures.

Structural Flexibility: The perovskite structure allows for substitutions and variations, enabling tunable properties based on the specific application.

Applications

Thin-Film Superconductors: These targets are used to deposit films that can be applied in superconducting circuits and devices, potentially leading to advancements in lossless energy transmission.

Electronic Devices: The electrical properties of Nd1-xSrxNiO2 films can be exploited in sensors, transistors, and other electronic components.

Catalysis: This material may also be used in catalytic applications, particularly in reactions involving hydrogen production and fuel cells.

Thermoelectric Materials: Films deposited from these targets can be utilized in thermoelectric devices, converting temperature differences into electrical energy.