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Neodymium Copper Oxide Sputtering Targets

Neodymium Copper Oxide Sputtering Targets

Neodymium Copper Oxide Sputtering Targets
Product No NRE-43258
CAS No. NA
Formula Nd2CuO4
Molecular Weight 335.33
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Neodymium Copper Oxide Sputtering Targets

Neodymium copper oxide (NdCuO) sputtering targets have several important applications, particularly in advanced materials and electronics.

High-Temperature Superconductors: NdCuO is researched for its potential as a high-temperature superconductor, which can be applied in power transmission, magnetic levitation, and medical imaging technologies (like MRI).

Thin Film Transistors (TFTs): These targets can be used in the fabrication of thin film transistors, which are critical components in display technologies such as LCDs and OLEDs.

Photovoltaics: NdCuO thin films may be explored in solar cell applications foimproving efficiency and performance, particularly in tandem solar cells.

Optical Devices: The unique optical properties of neodymium copper oxide make it suitable for creating coatings that enhance the performance of optical devices.

Catalysis: NdCuO can be studied for its catalytic properties in various chemical reactions, including those relevant to energy conversion and environmental applications.

Electrodes: These materials can be utilized in battery and fuel cell technologies, where their conductivity and stability under various conditions are advantageous.

Research and Development: As a subject of ongoing research, NdCuO sputtering targets are used in experimental settings to investigate new material properties and potential applications in electronics and materials science.

Overall, neodymium copper oxide sputtering targets contribute to advancements in several cutting-edge fields, particularly in electronics and energy.

 

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