Tantalum Oxide Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Oxide Sputtering Target | |
Product No | NRE-43147 |
CAS No. | 1314-61-0 |
Formula | Ta2O5 |
Molecular Weight | 441.89 g/mol |
Purity | 99.99% |
Thickness | 3 mm ± 0.5mm (customized) |
Diameter | 50 mm ± 1mm (customized) |
Shape | Round |
Tantalum Oxide Sputtering Target
Applications
Tantalum oxide sputtering target is a high-k dielectric material known for its excellent electrical, optical, and thermal properties. Sputtering targets made from tantalum oxide have a variety of applications across different industries. Here are some key applications:
Dielectric Materials:
Microelectronics: Tantalum oxide is widely used as a high-k dielectric material in capacitors and transistors, improving capacitance and device performance while enabling miniaturization in integrated circuits.
Optical Coatings:
Ta₂O₅ is used in optical coatings for lenses and mirrors, where it provides anti-reflective properties and enhances transmission and reflection characteristics.
Thin Film Photovoltaics:
Tantalum oxide films can be used in thin-film solar cells, helping to improve light absorption and overall energy conversion efficiency.
Protective Coatings:
The material is applied as a protective coating on various substrates to enhance wear resistance and chemical stability, particularly in harsh environments.
Biomedical Applications:
Due to its biocompatibility and chemical stability, tantalum oxide is explored for use in biomedical devices and implants, contributing to applications in orthopedics and dental implants.
Research Applications:
Tantalum oxide is a subject of interest in materials science research, particularly in studies involving high-k dielectrics, superconductors, and nanostructured materials.
Sensors:
Ta₂O₅ can be employed in gas sensors and other sensing devices, particularly those requiring sensitivity to environmental changes.