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Tantalum Oxide Sputtering Target

Tantalum Oxide Sputtering Target

Tantalum Oxide Sputtering Target
Product No NRE-43147
CAS No. 1314-61-0
Formula Ta2O5
Molecular Weight 441.89 g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (customized)
Diameter 50 mm ± 1mm (customized)
Shape Round

 

Tantalum Oxide Sputtering Target

Applications

Tantalum oxide sputtering target is a high-k dielectric material known for its excellent electrical, optical, and thermal properties. Sputtering targets made from tantalum oxide have a variety of applications across different industries. Here are some key applications:

Dielectric Materials:

Microelectronics: Tantalum oxide is widely used as a high-k dielectric material in capacitors and transistors, improving capacitance and device performance while enabling miniaturization in integrated circuits.

Optical Coatings:

Ta₂O₅ is used in optical coatings for lenses and mirrors, where it provides anti-reflective properties and enhances transmission and reflection characteristics.

Thin Film Photovoltaics:

Tantalum oxide films can be used in thin-film solar cells, helping to improve light absorption and overall energy conversion efficiency.

Protective Coatings:

The material is applied as a protective coating on various substrates to enhance wear resistance and chemical stability, particularly in harsh environments.

Biomedical Applications:

Due to its biocompatibility and chemical stability, tantalum oxide is explored for use in biomedical devices and implants, contributing to applications in orthopedics and dental implants.

Research Applications:

Tantalum oxide is a subject of interest in materials science research, particularly in studies involving high-k dielectrics, superconductors, and nanostructured materials.

Sensors:

Ta₂O₅ can be employed in gas sensors and other sensing devices, particularly those requiring sensitivity to environmental changes.

 

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