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Vanadium Oxide Sputtering Target

Vanadium Oxide Sputtering Target

Vanadium Oxide Sputtering Target
Product No NRE-43172
CAS No. 1314-34-7
Formula V2O3
Molecular Weight 149.88 g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

 

Vanadium Oxide Sputtering Target

Introduction:

Vanadium oxide sputtering target is a versatile compound known for its unique properties, including variable oxidation states and temperature-sensitive electrical conductivity. It exhibits semiconductor behavior and has gained significant attention for its potential applications in electronics, optics, and materials science. Sputtering targets made from vanadium oxide are utilized in physical vapor deposition (PVD) processes to produce thin films with tailored characteristics for various advanced applications.

Applications

Smart Windows: VO₂ is used in energy-efficient window coatings that can switch from transparent to reflective based on temperature, helping to regulate indoor temperatures and reduce energy costs.

Electronics: Vanadium oxide thin films are employed in the fabrication of electronic devices, including field-effect transistors (FETs) and memory devices, taking advantage of their semiconductor properties.

Sensors: VO₂ is utilized in temperature and gas sensors, where its sensitivity to changes in temperature and environment can be exploited for precise measurements.

Optoelectronic Devices: Vanadium oxide coatings can enhance the performance of optoelectronic devices, such as photodetectors and solar cells, by improving light absorption and conversion efficiency.

Catalysis: Vanadium oxide is used as a catalyst or catalyst support in chemical reactions, particularly in processes like oxidative dehydrogenation and selective oxidation.

Research Applications: Sputtering targets made from vanadium oxide are also utilized in laboratories for research on new materials, thin film technologies, and studies involving phase transitions.

 

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